GEMÜ P35 for ultra-pure applications

Good flow capability in a compact space

With the 2/2-way diaphragm globe valve GEMÜ P35, GEMÜ offers a compact and high-performance solution for ultra-pure applications in the semiconductor industry. The valve combines a space-saving design with high flow rates, making it particularly suitable for process tools where efficient use of the available installation space is crucial. In the semiconductor industry, complex processes and stringent cleanroom conditions place high demands on the components used. At the same time, the efficient use of the available installation space plays a key role. This is precisely where the GEMÜ P35 comes into its own: Its particularly compact design allows for space-saving integration, whilst high Kv values ensure a high media flow rate. With an operating pressure of up to 6 bar, the valve is designed to meet the requirements of process tool applications in the semiconductor industry.

Plug diaphragm technology for high process reliability

A key feature of the GEMÜ P35 is the plug diaphragm (PD) technology. It hermetically separates the medium from the actuator, thereby contributing to a high level of process reliability. At the same time, the plug diaphragm’s flat design allows for efficient use of installation space and minimizes dead space. The media-wetted components, made from modified PTFE and PFA, are designed for corrosive media and ensure the required level of purity. The GEMÜ P35 is available in actuator sizes 1 and 2 and in nominal sizes ranging from ¼" to ¾". Flare and Nexus Connect® connections are available for integration into various plant designs.

Up to 55 percent reduction in volume with higher Kv values

As a further development of the GEMÜ C50, the GEMÜ P35 opens up additional possibilities for integration into customized multi-port valve blocks GEMÜ PC50. Compared with integrating a GEMÜ C50 into a multi-port valve block GEMÜ PC50, the GEMÜ P35 enables volume reductions of up to 55 percent whilst achieving higher Kv values. The GEMÜ P35 thus combines a compact design with high flow capacity and process reliability, offering a high-performance solution for demanding applications in the semiconductor industry.